Nanotextured Shrink Wrap Superhydrophobic Surfaces by Argon Plasma Etching

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Nanotextured Shrink Wrap Superhydrophobic Surfaces by Argon Plasma Etching

We present a rapid, simple, and scalable approach to achieve superhydrophobic (SH) substrates directly in commodity shrink wrap film utilizing Argon (Ar) plasma. Ar plasma treatment creates a stiff skin layer on the surface of the shrink film. When the film shrinks, the mismatch in stiffness between the stiff skin layer and bulk shrink film causes the formation of multiscale hierarchical wrinkl...

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ژورنال

عنوان ژورنال: Materials

سال: 2016

ISSN: 1996-1944

DOI: 10.3390/ma9030196